Equipment
Large-scale Raman-nonlinear spectroscopy imaging system
Working scope：35 cm×35 cm ; Spatial resolution：~500 nm
Excitation wavelength： ①514 nm CW ②1064 nm Pulse Width 10 ps ③1550 nm Pulse Width 500 fs
Scanning tunneling microscope-low energy electron diffraction system
（Jointly developed with Ying jiang's research group）
Tip-sample distance drift is less than 0.1 pm/min
Circuit noise background as low as 5 fA/Hz1/2
In-situ ultrafast spectroscopy with spherical aberration electron microscope system
（Jointly developed with Xuedong Bai's research group）
Spatial resolution of spherical aberration electron microscope：~100 pm
Ultrafast pump-probe time resolution：~500 fs
Liquid Helium Cryogenic Measurement System
The cryostat temperature is adjustable from 4K to 350K, liquid helium refrigeration, homemade
Low temperature transport test platform
Current accuracy：0.1 fA ； Voltage accuracy：0.5 μV ； Minimum operating temperature：80 K
Atomic force microscopy
Scan range: XY axis 30 um, Z axis 5 um； Compatible with Scanning Kelvin Microscope (SKPM), Electrostatic Force Microscope (EFM)
Micro-area absorption spectroscopy system
The wavelength range of supercontinuum light source covers 410~2400 nm，total power>3600 mW
Micro-area test systemx,y,z direction accuracy up to 5 nm，range 20 um
Confocal Scanning Spectroscopy System
Working scope：100 um×100 um ；Spatial resolution：~0.3 nm
Excitation wavelength：①532 nm CW ②633 nm CW ③400~2300 nm Pulse， Pulse Width 120 fs.
Ultrafast Nanospectroscopy Characterization System
Spectral Physics Ultrafast Laser System
Repetition frequency 80 MHz，Pulse Width 150 fs，Wavelength range 400 nm~2300 nm
Coherent Ultrafast Laser Systems
Repetition frequency 250 KHz，Pulse Width 150 fs，Wavelength range 400 nm~2500 nm
Chemical Vapor Deposition System
Maximum operating temperature：1200℃、1700℃